Machine：Hermal Evaporator + Glove Box Instrument Committee：Prof. Meng, Hsin-Fei Laboratory Phone：56223

Information:

1.Brand Model: Thermal resistance evaporation system: Junshang / Glovebox: Mbraun

2.Purchase Date: 2010

3.Seat: Boai campus Nano Facility Center 2F, 114R  (TEL:55683)

4.Services: The use of photoresist exposure in the ITO glass drive circuit process.

5.Specifications:

(1).Hermal Evaporator :

(a).Metal can be deposited on substrates below 70mm × 80mm.

(b).The evaporation room reaches 5 × 10-6 Torr about 10 minutes.

(2).Glove Box:

(a).Within 4 hours of starting the cycle after the purge is completed, it reaches O2 <1 ppm.

(b).Box leakage rate <0.05% / h.

(c).Purifier efficiency can be maintained at O2 <1 ppm environment, can maintain 1ppm for more than 84 days.

(d).Environment <1 ppm O2 injection (1 liter) Reach within 10 ppm within 16 minutes.

(e).The above parameters are provided by the manufacturer. If there are any errors in the experimental results, this unit will not be responsible.

(f).Movable water and oxygen analyzer.

(g).The glove box of this system only provides metal evaporation.

(h).This system provides UV packaging equipment.

Application form: Experiment application form

Charging standard:

	School Organization/Research Organization	Profit-Making Enterprise
Delegated operation (NTD/hr)	600	1500
Self Operation (NTD/hr)	300	Not open
Assessment training (NTD/Once)	300	Not open
Material cost (NTD/Once)	Al=200   /  Ca=500   /  LiF=300   /  MoO3=500   /  Au=Current price  /  Ag=Current price  /  pentacene=Current price  /   C60=Current price