Machine：Mask Aligner Instrument Committee：Prof. Hsu, Wen-Syang Laboratory Phone：55149

Information:

1.Brand Model: K-310P-100S

2.Purchase Date: 2002/8/1

3.Seat: Boai campus Nano Facility Center 2F, 218R  (TEL:55679)

4.Services: Mask alignment and exposure.

5.Specifications:

(1).Applicable mask size: 5”

(2).Applicable chip size: 4”

(3).Exposure source model ML-251A/B (by USHIO), 250W ultra-high pressure mercury lamp, dominant wavelength 365nm.

(4).Resolution: 1um

(5).Power supply: HB-25103BY-C (by USHIO)

(6).Microscope: NIKON